Direct nanopatterning of silsesquioxane/poly(ethylene glycol) blends with high stability and nonfouling properties

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Title
Direct nanopatterning of silsesquioxane/poly(ethylene glycol) blends with high stability and nonfouling properties
Author(s)
B K Lee; T Kawai; Bong Hyun Chung
Bibliographic Citation
Macromolecular Bioscience, vol. 11, no. 5, pp. 600-606
Publication Year
2011
Abstract
A free-radical-polymerizable SSQ/PEG blend with direct patternability has been proposed as an ideal nonfouling material for nanostructure-based biomedical applications. Cured SSQ/PEG networks show an UV transparency of >90% at 365nm, high resistance to organic/aqueous solutions, hydrophilicity and Young's moduli of 1.898-2.815GPa. SSQ/PEG patterns with 25-nm linewidths, 25-nm spacing, and an aspect ratio of 4:1 were directly fabricated on transparent substrates by UV embossing, and cured SSQ/PEG networks with long-term stability under chemical, thermal, and biological stress showed strong resistance to the nonspecific adsorption of biomolecules. These characteristics may offer a new strategy for the development of a number of medical nanodevice applications such as labs-on-a-chip.
Keyword
CrosslinkingDirect nanopatterningMechanical propertiesNonfouling materialsSilsesquioxanes
ISSN
1616-5187
Publisher
Wiley
DOI
http://dx.doi.org/10.1002/mabi.201000362
Type
Article
Appears in Collections:
1. Journal Articles > Journal Articles
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