Nonstick, modulus-tunable and gas-permeable replicas for mold-based, high-resolution nanolithography

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Title
Nonstick, modulus-tunable and gas-permeable replicas for mold-based, high-resolution nanolithography
Author(s)
B K Lee; Hyeon Min Jo; Bong Hyun Chung
Bibliographic Citation
Advanced Functional Materials, vol. 21, no. 19, pp. 3681-3689
Publication Year
2011
Abstract
A fundamental approach to fabricating a nonstick replica mold with high performance for the manufacturing of high-resolution nanostructures using mold-based lithography is presented. Low-viscosity liquid blends consisting of methacrylate multi-functionalized silsesquioxane (SSQMA), difunctional acrylics, and a small amount of silicone diacrylate (Si-DA) with low surface tension were used as nonstick replica-mold materials. The cured SSQMA/acrylic/Si-DA networks showed a high resistance to organic solvents (<1.2 wt.%), high UV transparency (>90% at 365 nm), hydrophobicity (water contact angle >90°), high modulus and wide-range modulus tunability (0.6-4.42 GPa) and small shrinkage (<3% in height). The mold materials with a nonstick property conferred by Si-DA possessed the ability to form sub-25-nm features with a high line-to-space ratio (1:1) and a high aspect ratio (4:1). In addition, a sufficiently cured replica mold with a low concentration of residual, uncross-linked (meth)acrylates was able to successfully replicate sub-25-nm features with a high line-to-space ratio (1:1) and a high aspect ratio (4:1), even if the release agent was not modified. Furthermore, replica molds can potentially be used to fabricate patterns free of bubble defects because of sufficient gas permeability.
Keyword
gas permeabilityhybrid materialsmechanical propertiesnanoimprintingnonstick replica molds
ISSN
1616-301X
Publisher
Wiley
DOI
http://dx.doi.org/10.1002/adfm.201101278
Type
Article
Appears in Collections:
1. Journal Articles > Journal Articles
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