Cited 3 time in
- Title
- FERONIA confers resistance to photooxidative stress in Arabidopsis
- Author(s)
- Seung Yong Shin; Ji-Sun Park; Hye Bin Park; Ki Beom Moon; Hyun-Soon Kim; Jae Heung Jeon; Hye Sun Cho; Hyo Jun Lee
- Bibliographic Citation
- Frontiers in Plant Science, vol. 12, pp. 714938-714938
- Publication Year
- 2021
- Abstract
- Plants absorb light energy required for photosynthesis, but excess light can damage plant cells. To protect themselves, plants have developed diverse signaling pathways which are activated under high-intensity light. Plant photoprotection mechanisms have been mainly investigated under conditions of extremely high amount of light; thus, it is largely unknown how plants manage photooxidative damage under moderate light intensities. In the present study, we found that FERONIA (FER) is a key protein that confers resistance to photooxidative stress in plants under moderate light intensity. FER-deficient mutants were highly susceptible to increasing light intensity and exhibited photobleaching even under moderately elevated light intensity (ML). Light-induced expression of stress genes was largely diminished by the fer-4 mutation. In addition, excitation pressure on Photosystem II was significantly increased in fer-4 mutants under ML. Consistently, reactive oxygen species, particularly singlet oxygen, accumulated in fer-4 mutants grown under ML. FER protein abundance was found to be elevated after exposure to ML, which is indirectly affected by the ubiquitin-proteasome pathway. Altogether, our findings showed that plants require FER-mediated photoprotection to maintain their photosystems even under moderate light intensity.
- Keyword
- FERONIAPhotoprotectionPhotooxidative damageStress resistanceROS
- ISSN
- 1664-462X
- Publisher
- Frontiers Media Sa
- DOI
- http://dx.doi.org/10.3389/fpls.2021.714938
- Type
- Article
- Appears in Collections:
- Division of Research on National Challenges > Plant Systems Engineering Research > 1. Journal Articles
- Files in This Item:
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