FERONIA confers resistance to photooxidative stress in Arabidopsis

Cited 3 time in scopus
Metadata Downloads
FERONIA confers resistance to photooxidative stress in Arabidopsis
Seung Yong Shin; Ji-Sun Park; Hye Bin Park; Ki Beom Moon; Hyun-Soon Kim; Jae Heung Jeon; Hye Sun ChoHyo Jun Lee
Bibliographic Citation
Frontiers in Plant Science, vol. 12, pp. 714938-714938
Publication Year
Plants absorb light energy required for photosynthesis, but excess light can damage plant cells. To protect themselves, plants have developed diverse signaling pathways which are activated under high-intensity light. Plant photoprotection mechanisms have been mainly investigated under conditions of extremely high amount of light; thus, it is largely unknown how plants manage photooxidative damage under moderate light intensities. In the present study, we found that FERONIA (FER) is a key protein that confers resistance to photooxidative stress in plants under moderate light intensity. FER-deficient mutants were highly susceptible to increasing light intensity and exhibited photobleaching even under moderately elevated light intensity (ML). Light-induced expression of stress genes was largely diminished by the fer-4 mutation. In addition, excitation pressure on Photosystem II was significantly increased in fer-4 mutants under ML. Consistently, reactive oxygen species, particularly singlet oxygen, accumulated in fer-4 mutants grown under ML. FER protein abundance was found to be elevated after exposure to ML, which is indirectly affected by the ubiquitin-proteasome pathway. Altogether, our findings showed that plants require FER-mediated photoprotection to maintain their photosystems even under moderate light intensity.
FERONIAPhotoprotectionPhotooxidative damageStress resistanceROS
Frontiers Media Sa
Appears in Collections:
Division of Research on National Challenges > Plant Systems Engineering Research > 1. Journal Articles
Files in This Item:
  • There are no files associated with this item.

Items in OpenAccess@KRIBB are protected by copyright, with all rights reserved, unless otherwise indicated.